Self-Assembled Monolayers for Silicon Passivated Contacts: Paper No. 050004

William Nemeth; Steve Harvey; David Young; Matt Page; Vincenzo La Salvia; San Theingi; Pauls Stradins

doi:10.1063/5.0089764

Self-Assembled Monolayers for Silicon Passivated Contacts: Paper No. 050004

Research output: Contribution to conference › Paper

2 Scopus Citations

Abstract

We present the application of self assembled monolayers (SAM) produced from hexamethyldisilazane (HMDS), to the polysilicon/tunneling SiO2 interface as well as the external surface for application to silicon passivated contact solar cells. By immersing tunnel SiO2 on cSi in the HMDS solution, almost complete trimethylsilyl coverage is achieved. This provides better adhesion for PECVD grown a-Si:H due to the presence of carbon, and subsequent high temperature crystallization does not lead to blistering, nor degrade surface or bulk passivation. This is demonstrated on passivated contact solar cells and symmetric structures. Furthermore, an HMDS functionalized surface is resistant to HF and TMAH etchants, but can be patterned with UV light, creating a selective mask template for subsequent wet etch.

Original language	American English
Number of pages	4
DOIs	https://doi.org/10.1063/5.0089764
State	Published - 2022
Event	SiliconPV 2021: The 11th International Conference on Crystalline Silicon Photovoltaics - Hamelin, Germany Duration: 19 Apr 2021 → 23 Apr 2021

Conference

Conference	SiliconPV 2021: The 11th International Conference on Crystalline Silicon Photovoltaics
City	Hamelin, Germany
Period	19/04/21 → 23/04/21

NLR Publication Number

NREL/CP-5900-80514

Keywords

hexamethyldisilazane
HMDS
passivated contact
photovoltaic
poly SiO2
PV

Access to Document

10.1063/5.0089764

Cite this

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title = "Self-Assembled Monolayers for Silicon Passivated Contacts: Paper No. 050004",

abstract = "We present the application of self assembled monolayers (SAM) produced from hexamethyldisilazane (HMDS), to the polysilicon/tunneling SiO2 interface as well as the external surface for application to silicon passivated contact solar cells. By immersing tunnel SiO2 on cSi in the HMDS solution, almost complete trimethylsilyl coverage is achieved. This provides better adhesion for PECVD grown a-Si:H due to the presence of carbon, and subsequent high temperature crystallization does not lead to blistering, nor degrade surface or bulk passivation. This is demonstrated on passivated contact solar cells and symmetric structures. Furthermore, an HMDS functionalized surface is resistant to HF and TMAH etchants, but can be patterned with UV light, creating a selective mask template for subsequent wet etch.",

keywords = "hexamethyldisilazane, HMDS, passivated contact, photovoltaic, poly SiO2, PV",

author = "William Nemeth and Steve Harvey and David Young and Matt Page and \{La Salvia\}, Vincenzo and San Theingi and Pauls Stradins",

year = "2022",

doi = "10.1063/5.0089764",

language = "American English",

note = "SiliconPV 2021: The 11th International Conference on Crystalline Silicon Photovoltaics ; Conference date: 19-04-2021 Through 23-04-2021",

}

TY - CONF

T1 - Self-Assembled Monolayers for Silicon Passivated Contacts

T2 - SiliconPV 2021: The 11th International Conference on Crystalline Silicon Photovoltaics

AU - Nemeth, William

AU - Harvey, Steve

AU - Young, David

AU - Page, Matt

AU - La Salvia, Vincenzo

AU - Theingi, San

AU - Stradins, Pauls

PY - 2022

Y1 - 2022

N2 - We present the application of self assembled monolayers (SAM) produced from hexamethyldisilazane (HMDS), to the polysilicon/tunneling SiO2 interface as well as the external surface for application to silicon passivated contact solar cells. By immersing tunnel SiO2 on cSi in the HMDS solution, almost complete trimethylsilyl coverage is achieved. This provides better adhesion for PECVD grown a-Si:H due to the presence of carbon, and subsequent high temperature crystallization does not lead to blistering, nor degrade surface or bulk passivation. This is demonstrated on passivated contact solar cells and symmetric structures. Furthermore, an HMDS functionalized surface is resistant to HF and TMAH etchants, but can be patterned with UV light, creating a selective mask template for subsequent wet etch.

AB - We present the application of self assembled monolayers (SAM) produced from hexamethyldisilazane (HMDS), to the polysilicon/tunneling SiO2 interface as well as the external surface for application to silicon passivated contact solar cells. By immersing tunnel SiO2 on cSi in the HMDS solution, almost complete trimethylsilyl coverage is achieved. This provides better adhesion for PECVD grown a-Si:H due to the presence of carbon, and subsequent high temperature crystallization does not lead to blistering, nor degrade surface or bulk passivation. This is demonstrated on passivated contact solar cells and symmetric structures. Furthermore, an HMDS functionalized surface is resistant to HF and TMAH etchants, but can be patterned with UV light, creating a selective mask template for subsequent wet etch.

KW - hexamethyldisilazane

KW - HMDS

KW - passivated contact

KW - photovoltaic

KW - poly SiO2

KW - PV

UR - https://www.scopus.com/pages/publications/85137488356

U2 - 10.1063/5.0089764

DO - 10.1063/5.0089764

M3 - Paper

Y2 - 19 April 2021 through 23 April 2021

ER -

Self-Assembled Monolayers for Silicon Passivated Contacts: Paper No. 050004

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Keywords

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