@misc{309c4c58a2b44186834b653e3466829d,
title = "Self-Assembled Monolayer Procedure to Pattern Silicon Passivated Contacts",
abstract = "We utilize hexamethyldisilazane (HMDS)-based self-assembled monolayers to pattern polysilicon (polySi) passivated contacts. We find process conditions that allow for etching frontside n/polySi between fingers, thereby increasing Jsc. Importantly, the Voc does not degrade indicating the additional process steps do not introduce defects or impurities. HMDS layers remain on the surface for metallization without detriment to transport.",
keywords = "hexamethyldisilazane, HMDS, monolayer, passivated contact, photovoltaic, poly-Si, polysilicon, PV, self-assembled",
author = "William Nemeth and David Young and Matthew Page and Vincenzo LaSalvia and San Theingi and Pauls Stradins",
year = "2023",
language = "American English",
series = "Presented at the 50th IEEE Photovoltaic Specialists Conference, 11-16 June 2023, San Juan, Puerto Rico",
publisher = "National Laboratory of the Rockies (NLR)",
address = "United States",
type = "Other",
}