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Resistive Switching in SrFeO2.5/Nb:SrTiO3 Heterostructures with Growth-Controlled Film Orientation

  • Keon Sahebkar
  • , Chaitanya Sharma
  • , Garrett Baucom
  • , Cullen Hutchison
  • , Hunter Long
  • , Andrew Boozer
  • , M. Tellekamp
  • , Honggyu Kim
  • , Juan Nino
  • , Ryan Need
  • University of Florida
  • University of California at San Diego

Research output: Contribution to journalArticlepeer-review

Abstract

Resistive switching, a behavior found in many oxide materials, has the potential to enable emerging computer hardware technologies and architectures. We present resistive switching devices fabricated from epitaxial brownmillerite SrFeO2.5 films with two distinct film orientations, wherein facile oxygen ion diffusion planes are aligned parallel (in-plane) and perpendicular (out-of-plane) with the electrodes. SrFeO2.5 films were grown on (001) oriented Nb:SrTiO3 to enable high-quality interfaces and future integration with Si CMOS technologies. Post-growth vacuum annealing and growth pressure were used to control film orientations, as confirmed by transmission electron microscopy and x-ray diffraction measurements. Films grown with diffusion planes oriented in-plane had oxygen-rich, perovskite-like nanodomains spread throughout the film, and fabricated devices exhibited worse switching consistency and more stochasticity. In contrast, films grown with diffusion planes oriented out-of-plane had a more uniform oxygen-rich perovskite interfacial layer above the bottom electrode, and devices built from this film orientation showed significant statistical improvements in switching voltages and cycling consistency.
Original languageAmerican English
Number of pages8
JournalApplied Physics Letters
Volume127
Issue number10
DOIs
StatePublished - 2025

NLR Publication Number

  • NREL/JA-5K00-96688

Keywords

  • memristor
  • oxide
  • pld
  • rram

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