@article{e65c6be64f8142a381bed81a29a0341c,
title = "Physics and Chemistry of Hot-Wire Chemical Vapor Deposition from Silane: Measuring and Modeling the Silicon Epitaxy Deposition Rate: Article No. 054906",
keywords = "deposition rate, film, vapor",
author = "Ina Martin and Charles Teplin and James Doyle",
year = "2010",
doi = "10.1063/1.3298455",
language = "American English",
volume = "107",
journal = "Journal of Applied Physics",
issn = "0021-8979",
publisher = "American Institute of Physics",
number = "5",
}