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Physical Properties of HWCVD Microcrystalline Silicon Thin Films
H. R. Moutinho
, M. J. Romero
,
C. S. Jiang
, Y. Xu
,
B. P. Nelson
, K. M. Jones
, A. H. Mahan
, M. M. Al-Jassim
Materials Science
Materials, Chemical, and Computational Science Research Operations
National Renewable Energy Laboratory
Research output
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Contribution to conference
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peer-review
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Engineering
Seed Layer
100%
Thin Films
100%
Microcrystalline Silicon
100%
Dilution
100%
Crystal Structure
100%
Atomic Force Microscopy
50%
Irregular Shape
50%
Si Substrate
50%
Ray Diffraction
50%
Deposited Film
50%
Hydrogen Dilution
50%
Subgrains
50%
Glass Substrate
50%
Material Science
Film
100%
Microcrystalline Silicon
100%
Physical Property
100%
Thin Films
100%
Dilution
50%
Crystal Structure
33%
Scanning Electron Microscopy
16%
X-Ray Diffraction
16%
Atomic Force Microscopy
16%
Crystallization
16%