Photoemission Investigation on the Effect of H2S Plasma Exposure of InP

Photoemission Investigation on the Effect of H2S Plasma Exposure of InP

NREL

Research output: Contribution to conference › Paper

Original language	American English
Pages	181-187
Number of pages	7
State	Published - 1993
Event	Surface Chemical Cleaning and Passivation for Semiconductor Processing: Materials Research Society Symposium - San Francisco, California Duration: 13 Apr 1993 → 15 Apr 1993

Conference

Conference	Surface Chemical Cleaning and Passivation for Semiconductor Processing: Materials Research Society Symposium
City	San Francisco, California
Period	13/04/93 → 15/04/93

NLR Publication Number

ACNR/CP-14472

Cite this

@conference{b1b4af7ca0d340e68c40962b554fcc99,

title = "Photoemission Investigation on the Effect of H2S Plasma Exposure of InP",

author = "NREL",

year = "1993",

language = "American English",

pages = "181--187",

note = "Surface Chemical Cleaning and Passivation for Semiconductor Processing: Materials Research Society Symposium ; Conference date: 13-04-1993 Through 15-04-1993",

}