Abstract
Goal is to demo realistic path to III-V multijunction concentrator efficiencies > 40% by substrate-engineering combining compositional grading with patterned epitaxy for small-area cells for high concentration.
| Original language | American English |
|---|---|
| Publisher | National Laboratory of the Rockies (NLR) |
| Number of pages | 12 |
| State | Published - 2008 |
Bibliographical note
Work performed by The Ohio State University, Columbus, OhioNLR Publication Number
- NREL/SR-520-44250
Keywords
- compositional grading
- dual junction
- GE Subtrate
- III-V multijunction concentrator
- InGaP/InGaAs
- lattice match
- patterned Si:Ge/Si
- PV
- small area
- solar cells
- thermal conductivity
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