Observation and Mitigation of RF-Plasma-Induced Damage to III-Nitrides Grown by Molecular Beam Epitaxy

Physics

• Adatoms 16%
• Atomic Force Microscopy 16%
• Blood Plasma 100%
• Desorption 16%
• Electron Diffraction 16%
• Electrostatic Probe 16%
• Energetics 16%
• Energy Gaps (Solid State) 16%
• High Energy Electron 16%
• Indium 16%
• Light Emission 16%
• Molecular Beam Epitaxy 100%
• Nitride 100%
• Nitrogen Plasma 16%
• Optical Emission Spectroscopy 16%
• Photoelectric Emission 16%
• Photoluminescence 16%
• Plasma Frequency 100%
• Positive Ion 16%
• Room Temperature 16%

Material Science

• Atomic Force Microscopy 33%
• Desorption 33%
• Emission Spectroscopy 33%
• Film 100%
• Indium 33%
• Molecular Beam Epitaxy 100%
• Nitride Compound 100%
• Photoluminescence 33%
• Reflection High-Energy Electron Diffraction 33%
• Surface (Surface Science) 66%
• Surface Morphology 33%

Engineering

• Atomic Force Microscopy 20%
• Band Gap 20%
• Damaging Effect 20%
• Electron Concentration 40%
• Energetics 20%
• Energy Electron Diffraction 20%
• Energy Shift 20%
• Induced Damage 100%
• Light Emission 40%
• Nitride 100%
• Radio Frequency 100%
• Room Temperature 20%
• Smooth Surface 20%
• Surface Morphology 20%
• Temperature Range 20%