Nickel Oxide Interlayer Films from Nickel Formate-Ethylenediamine Precursor: Influence of Annealing on Thin Film Properties and Photovoltaic Device Performance
- K. X. Steirer
- , R. E. Richards
- , A. K. Sigdel
- , A. Garcia
- , P. F. Ndione
- , S. Hammond
- , D. Baker
- , E. L. Ratcliff
- , C. Curtis
- , T. Furtak
- , D. S. Ginley
- , D. C. Olson
- , N. R. Armstrong
- , J. J. Berry
- University of Arizona
- National Renewable Energy Laboratory
- Colorado School of Mines
- University of Denver
- Intel
- NEXT ENERGY TECHNOLOGIES INC.
- University of Washington
Research output: Contribution to journal › Article › peer-review
49
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