Abstract
A diffusion time-of-flight (TOF) technique is described and analysis is performed on four different p-GaAs heterostructure devices. These p/n junction devices were grown by metal organic chemical vapor deposition (MOCVD). Both Zn and Mg were used as dopants with concentrations ranging from 1X1018 to 1 × 1019 cm −3. We have been able to determine the diffusivity (D) along with upper and lower estimates of the diffusion length (LD). The results imply the presence of a mechanism such as photon recycling.
| Original language | American English |
|---|---|
| Pages (from-to) | 2004-2008 |
| Number of pages | 5 |
| Journal | Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films |
| Volume | 8 |
| Issue number | 3 |
| DOIs | |
| State | Published - 1990 |
Bibliographical note
Work performed by Solar Energy Research Institute, Golden, Colorado, and Varian Research Center, Palo Alto, CaliforniaNLR Publication Number
- ACNR/JA-213-11799
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