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Minority Carrier Diffusion Length of p-GaAs Determined by Time of Flight

  • B. M. Keyes
  • , D. J. Dunlavy
  • , R. K. Ahrenkiel
  • , S. E. Asher
  • , L. D. Partain
  • , D. D. Liu
  • National Renewable Energy Laboratory
  • Varian Research Center

Research output: Contribution to journalArticlepeer-review

12 Scopus Citations

Abstract

A diffusion time-of-flight (TOF) technique is described and analysis is performed on four different p-GaAs heterostructure devices. These p/n junction devices were grown by metal organic chemical vapor deposition (MOCVD). Both Zn and Mg were used as dopants with concentrations ranging from 1X1018 to 1 × 1019 cm −3. We have been able to determine the diffusivity (D) along with upper and lower estimates of the diffusion length (LD). The results imply the presence of a mechanism such as photon recycling.

Original languageAmerican English
Pages (from-to)2004-2008
Number of pages5
JournalJournal of Vacuum Science and Technology A: Vacuum, Surfaces and Films
Volume8
Issue number3
DOIs
StatePublished - 1990

Bibliographical note

Work performed by Solar Energy Research Institute, Golden, Colorado, and Varian Research Center, Palo Alto, California

NLR Publication Number

  • ACNR/JA-213-11799

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