Mechanisms of Thermal Equilibration in Doped Amorphous Silicon

Research output: Contribution to journal › Article

Work performed by Xerox Corporation, Palo Alto Research Center, Palo Alto, California

NLR Publication Number

@article{908749beea21466cbadf4ba1b57a9406,

title = "Mechanisms of Thermal Equilibration in Doped Amorphous Silicon",

author = "NREL",

note = "Work performed by Xerox Corporation, Palo Alto Research Center, Palo Alto, California",

year = "1988",

doi = "10.1103/PhysRevB.37.4209",

language = "American English",

volume = "37",

pages = "4209--4224",

journal = "Physical Review B",

issn = "0163-1829",

publisher = "American Institute of Physics",

number = "8",

}

TY - JOUR

T1 - Mechanisms of Thermal Equilibration in Doped Amorphous Silicon

AU - NREL, null

N1 - Work performed by Xerox Corporation, Palo Alto Research Center, Palo Alto, California

PY - 1988

Y1 - 1988

U2 - 10.1103/PhysRevB.37.4209

DO - 10.1103/PhysRevB.37.4209

M3 - Article

SN - 0163-1829

VL - 37

SP - 4209

EP - 4224

JO - Physical Review B

JF - Physical Review B

IS - 8

ER -