Initial Reactions at the Interface of Pt and Amorphous Silicon

Research output: Contribution to journal › Article

Original language	American English
Pages (from-to)	519-523
Number of pages	5
Journal	Journal of Vacuum Science and Technology B: Microelectronics Processing and Phenomena
Volume	1
Issue number	3
DOIs	https://doi.org/10.1116/1.582592
State	Published - 1983

Work performed by Xerox Palo Alto Research Center, Palo Alto, California

NLR Publication Number

@article{7f85493054eb44c6b0688e4283488263,

title = "Initial Reactions at the Interface of Pt and Amorphous Silicon",

author = "NREL",

note = "Work performed by Xerox Palo Alto Research Center, Palo Alto, California",

year = "1983",

doi = "10.1116/1.582592",

language = "American English",

volume = "1",

pages = "519--523",

journal = "Journal of Vacuum Science and Technology B: Microelectronics Processing and Phenomena",

issn = "0734-211X",

number = "3",

}

TY - JOUR

T1 - Initial Reactions at the Interface of Pt and Amorphous Silicon

AU - NREL, null

N1 - Work performed by Xerox Palo Alto Research Center, Palo Alto, California

PY - 1983

Y1 - 1983

U2 - 10.1116/1.582592

DO - 10.1116/1.582592

M3 - Article

SN - 0734-211X

VL - 1

SP - 519

EP - 523

JO - Journal of Vacuum Science and Technology B: Microelectronics Processing and Phenomena

JF - Journal of Vacuum Science and Technology B: Microelectronics Processing and Phenomena

IS - 3

ER -