Abstract
A new technique for making large-grain thin Si films is described in which optical excitation is used to enhance the grain growth. Grain sizes much larger than the film thickness can be obtained at low temperatures and in short process times. This method is well suited for making thin-film Si solar cells on low-temperature substrates.
| Original language | American English |
|---|---|
| Pages | 95-100 |
| Number of pages | 6 |
| State | Published - 1998 |
| Event | Proceedings of the 1997 MRS Fall Meeting - Boston, MA, USA Duration: 2 Dec 1997 → 5 Dec 1997 |
Conference
| Conference | Proceedings of the 1997 MRS Fall Meeting |
|---|---|
| City | Boston, MA, USA |
| Period | 2/12/97 → 5/12/97 |
NLR Publication Number
- NREL/CP-520-23207
Fingerprint
Dive into the research topics of 'Grain Enhancement of Polycrystalline Silicon Films Aided by Optical Excitation'. Together they form a unique fingerprint.Cite this
- APA
- Author
- BIBTEX
- Harvard
- Standard
- RIS
- Vancouver