Abstract
The hole lifetime in n-type Al0.10Ga0.90As is controlled by recombination centers with capture cross sections of about 10 -12 cm2. Correlated time-resolved photoluminescence and deep level transient spectroscopy measurements link these centers to well-known impurity oxygen complexes. Film growth at temperatures above about 720°C eliminate these oxygen complexes from the epitaxial layer resulting in greatly improved electronic properties.
| Original language | American English |
|---|---|
| Pages (from-to) | 1369-1371 |
| Number of pages | 3 |
| Journal | Applied Physics Letters |
| Volume | 63 |
| Issue number | 10 |
| DOIs | |
| State | Published - 1993 |
NLR Publication Number
- NREL/JA-412-5421
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