Film Stoichiometry and Gas Dissociation Kinetics in Hot-Wire Chemical Vapor Deposition of a-SiGe:H

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NLR Publication Number

@article{dc5c9b1a2b044c8382b5b6bc3a16e6e2,

title = "Film Stoichiometry and Gas Dissociation Kinetics in Hot-Wire Chemical Vapor Deposition of a-SiGe:H",

keywords = "amorphous silicon germanium alloys, hot-wire deposition",

author = "NREL",

year = "2008",

doi = "10.1016/j.tsf.2007.06.189",

language = "American English",

volume = "516",

pages = "526--528",

journal = "Thin Solid Films",

issn = "0040-6090",

publisher = "Elsevier B.V.",

number = "5",

}

TY - JOUR

T1 - Film Stoichiometry and Gas Dissociation Kinetics in Hot-Wire Chemical Vapor Deposition of a-SiGe:H

AU - NREL, null

PY - 2008

Y1 - 2008

KW - amorphous silicon germanium alloys

KW - hot-wire deposition

U2 - 10.1016/j.tsf.2007.06.189

DO - 10.1016/j.tsf.2007.06.189

M3 - Article

SN - 0040-6090

VL - 516

SP - 526

EP - 528

JO - Thin Solid Films

JF - Thin Solid Films

IS - 5

ER -