Fabrication of Boron Compensated Hydrogenated Amorphous Silicon Films with Significantly Improved Stability Using Plasma Enhanced Chemical Vapor Deposition Technique

Fabrication of Boron Compensated Hydrogenated Amorphous Silicon Films with Significantly Improved Stability Using Plasma Enhanced Chemical Vapor Deposition Technique

NREL

Research output: Contribution to conference › Paper

Original language	American English
Pages	45-50
Number of pages	6
State	Published - 1995
Event	Amorphous Silicon Technology 1995: Materials Research Society Symposium - San Francisco, California Duration: 18 Apr 1995 → 21 Apr 1995

Conference

Conference	Amorphous Silicon Technology 1995: Materials Research Society Symposium
City	San Francisco, California
Period	18/04/95 → 21/04/95

Bibliographical note

Work performed by Iowa State University, Ames, Iowa

NLR Publication Number

NREL/CP-20835

Cite this

@conference{c4e0bea1591241ffa7ee27e296b18caf,

title = "Fabrication of Boron Compensated Hydrogenated Amorphous Silicon Films with Significantly Improved Stability Using Plasma Enhanced Chemical Vapor Deposition Technique",

author = "NREL",

note = "Work performed by Iowa State University, Ames, Iowa; Amorphous Silicon Technology 1995: Materials Research Society Symposium ; Conference date: 18-04-1995 Through 21-04-1995",

year = "1995",

language = "American English",

pages = "45--50",

}

TY - CONF

T1 - Fabrication of Boron Compensated Hydrogenated Amorphous Silicon Films with Significantly Improved Stability Using Plasma Enhanced Chemical Vapor Deposition Technique

AU - NREL, null

N1 - Work performed by Iowa State University, Ames, Iowa

PY - 1995

Y1 - 1995

M3 - Paper

SP - 45

EP - 50

T2 - Amorphous Silicon Technology 1995: Materials Research Society Symposium

Y2 - 18 April 1995 through 21 April 1995

ER -