Effect of O2 Flow Concentration During Reactive Sputtering of Ni Oxide Thin Films on Their Electrochemical and Electrochromic Properties in Aqueous Acidic and Basic Electrolyte Solutions

doi:10.1143/JJAP.45.7780

Effect of O2 Flow Concentration During Reactive Sputtering of Ni Oxide Thin Films on Their Electrochemical and Electrochromic Properties in Aqueous Acidic and Basic Electrolyte Solutions

NREL

Chemistry and Nanoscience

Research output: Contribution to journal › Article › peer-review

Original language	American English
Pages (from-to)	7780-7783
Number of pages	4
Journal	Japanese Journal of Applied Physics, Part 2: Letters
Volume	45
Issue number	10A
DOIs	https://doi.org/10.1143/JJAP.45.7780
State	Published - 2006

NLR Publication Number

NREL/JA-590-41003

Access to Document

10.1143/JJAP.45.7780

Cite this

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title = "Effect of O2 Flow Concentration During Reactive Sputtering of Ni Oxide Thin Films on Their Electrochemical and Electrochromic Properties in Aqueous Acidic and Basic Electrolyte Solutions",

author = "NREL",

year = "2006",

doi = "10.1143/JJAP.45.7780",

language = "American English",

volume = "45",

pages = "7780--7783",

journal = "Japanese Journal of Applied Physics, Part 2: Letters",

issn = "0021-4922",

publisher = "Institute of Physics",

number = "10A",

}

TY - JOUR

T1 - Effect of O2 Flow Concentration During Reactive Sputtering of Ni Oxide Thin Films on Their Electrochemical and Electrochromic Properties in Aqueous Acidic and Basic Electrolyte Solutions

AU - NREL, null

PY - 2006

Y1 - 2006

U2 - 10.1143/JJAP.45.7780

DO - 10.1143/JJAP.45.7780

M3 - Article

SN - 0021-4922

VL - 45

SP - 7780

EP - 7783

JO - Japanese Journal of Applied Physics, Part 2: Letters

JF - Japanese Journal of Applied Physics, Part 2: Letters

IS - 10A

ER -