Diffractive Light Trapping in Crystal-Silicon Films: Experiment and Electromagnetic Modeling

Bill Nemeth; Qi Wang; Dirk Weiss; Douglas Keszler; Dustin Richmond

doi:10.1364/AO.50.005728

Diffractive Light Trapping in Crystal-Silicon Films: Experiment and Electromagnetic Modeling

Bill Nemeth
, Qi Wang
, Dirk Weiss
, Douglas Keszler
, Dustin Richmond

Washington Technology Center
Oregon State University

Research output: Contribution to journal › Article › peer-review

Original language	American English
Pages (from-to)	5728-5734
Number of pages	7
Journal	Applied Optics
Volume	50
Issue number	29
DOIs	https://doi.org/10.1364/AO.50.005728
State	Published - 2011

NLR Publication Number

NREL/JA-5200-53578

Keywords

crystal silicon films
electromagnetic modeling

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10.1364/AO.50.005728

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title = "Diffractive Light Trapping in Crystal-Silicon Films: Experiment and Electromagnetic Modeling",

keywords = "crystal silicon films, electromagnetic modeling",

author = "Bill Nemeth and Qi Wang and Dirk Weiss and Douglas Keszler and Dustin Richmond",

year = "2011",

doi = "10.1364/AO.50.005728",

language = "American English",

volume = "50",

pages = "5728--5734",

journal = "Applied Optics",

issn = "1559-128X",

publisher = "Optica Publishing Group",

number = "29",

}

TY - JOUR

T1 - Diffractive Light Trapping in Crystal-Silicon Films: Experiment and Electromagnetic Modeling

AU - Nemeth, Bill

AU - Wang, Qi

AU - Weiss, Dirk

AU - Keszler, Douglas

AU - Richmond, Dustin

PY - 2011

Y1 - 2011

KW - crystal silicon films

KW - electromagnetic modeling

UR - https://www.scopus.com/pages/publications/80053931576

U2 - 10.1364/AO.50.005728

DO - 10.1364/AO.50.005728

M3 - Article

SN - 1559-128X

VL - 50

SP - 5728

EP - 5734

JO - Applied Optics

JF - Applied Optics

IS - 29

ER -

Diffractive Light Trapping in Crystal-Silicon Films: Experiment and Electromagnetic Modeling

NLR Publication Number

Keywords

Access to Document

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