Abstract
Production requirements for transparent conductors for thin film photovoltaics are reviewed, with particular reference to magnetron sputtered zinc oxide. On-going optimization processes for ZnO:Al prepared on 0.43 m2 substrates by bipolar, reactive sputtering from ZnO:Al2O3 targets and by reactive sputtering from a Zn:Al target are described. Optical emission from the plasma is used to study thestate of the sputtering target. Attention is drawn to the spatial dependence of deposition conditions under the cathode.
| Original language | American English |
|---|---|
| Pages | 467-477 |
| Number of pages | 11 |
| State | Published - 1996 |
| Event | Thin Films for Photovoltaic and Related Device Applications: Materials Research Society Symposium - San Francisco, California Duration: 8 Apr 1996 → 11 Apr 1996 |
Conference
| Conference | Thin Films for Photovoltaic and Related Device Applications: Materials Research Society Symposium |
|---|---|
| City | San Francisco, California |
| Period | 8/04/96 → 11/04/96 |
Bibliographical note
Work performed by Energy Photovoltaics, Inc., Princeton, New JerseyNLR Publication Number
- NREL/CP-23041
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