Skip to main navigation
Skip to search
Skip to main content
National Laboratory of the Rockies Hub Home
Search content at National Laboratory of the Rockies
Hub Home
Researcher Profiles
Research Output
Research Organizations
Awards & Honors
Activities
Correlation of Stress with Photo-Degradation in Hydrogenated Amorphous Silicon Prepared by Hot-Wire CVD
NREL
Research output
:
Contribution to conference
›
Paper
Overview
Fingerprint
Fingerprint
Dive into the research topics of 'Correlation of Stress with Photo-Degradation in Hydrogenated Amorphous Silicon Prepared by Hot-Wire CVD'. Together they form a unique fingerprint.
Sort by
Weight
Alphabetically
Engineering
Compressive Stress
100%
Hydrogenated Amorphous Silicon
100%
Photodegradation
100%
Chemical Vapor Deposition
100%
Vapor Deposition
100%
Deposition Temperature
33%
Beam Bending
33%
Temperature Increase
33%
Thin Films
33%
Initial Value
33%
Silicon Dioxide
33%
Hydrogen
33%
Material Science
Amorphous Silicon
100%
Chemical Vapor Deposition
100%
Photodegradation
100%
Film
50%
Annealing
50%
Electronic Property
50%
Thin Films
50%
Hydrogen
50%