Controlled Nitrogen Doping and Film Colorimetrics in Porous TiO2 Materials Using Plasma Processing

Research output: Contribution to journal › Article › peer-review

Original language	American English
Pages (from-to)	1743-1753
Number of pages	11
Journal	ACS Applied Materials and Interfaces
Volume	2
Issue number	6
DOIs	https://doi.org/10.1021/am100233j
State	Published - 2010

NLR Publication Number

@article{23af70d6f41b40c08afcb8cdd644e7e3,

title = "Controlled Nitrogen Doping and Film Colorimetrics in Porous TiO2 Materials Using Plasma Processing",

keywords = "photocatalysis, photovoltaic, plasma surface modification, titanium dioxide",

author = "Ina Martin and Daniel Pulsipher and Ellen Fisher",

year = "2010",

doi = "10.1021/am100233j",

language = "American English",

volume = "2",

pages = "1743--1753",

journal = "ACS Applied Materials and Interfaces",

issn = "1944-8244",

publisher = "American Chemical Society",

number = "6",

}

TY - JOUR

T1 - Controlled Nitrogen Doping and Film Colorimetrics in Porous TiO2 Materials Using Plasma Processing

AU - Martin, Ina

AU - Pulsipher, Daniel

AU - Fisher, Ellen

PY - 2010

Y1 - 2010

KW - photocatalysis

KW - photovoltaic

KW - plasma surface modification

KW - titanium dioxide

U2 - 10.1021/am100233j

DO - 10.1021/am100233j

M3 - Article

SN - 1944-8244

VL - 2

SP - 1743

EP - 1753

JO - ACS Applied Materials and Interfaces

JF - ACS Applied Materials and Interfaces

IS - 6

ER -