'Low' Temperature Hydrogen Diffusion in Amorphous Silicon and Its Relation to Structural Stability

'Low' Temperature Hydrogen Diffusion in Amorphous Silicon and Its Relation to Structural Stability

NREL

Research output: Contribution to conference › Paper

Original language	American English
Number of pages	161
State	Published - 1987
Event	International Conference on Stability of Amorphous Silicon Alloy Materials and Devices - Palo Alto, California Duration: 28 Jan 1987 → 30 Jan 1987

Conference

Conference	International Conference on Stability of Amorphous Silicon Alloy Materials and Devices
City	Palo Alto, California
Period	28/01/87 → 30/01/87

Bibliographical note

Work performed by Xerox Palo Alto Research Center, Palo Alto, California

NLR Publication Number

ACNR/CP-8728

Cite this

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title = "'Low' Temperature Hydrogen Diffusion in Amorphous Silicon and Its Relation to Structural Stability",

author = "NREL",

note = "Work performed by Xerox Palo Alto Research Center, Palo Alto, California; International Conference on Stability of Amorphous Silicon Alloy Materials and Devices ; Conference date: 28-01-1987 Through 30-01-1987",

year = "1987",

language = "American English",

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TY - CONF

T1 - 'Low' Temperature Hydrogen Diffusion in Amorphous Silicon and Its Relation to Structural Stability

AU - NREL, null

N1 - Work performed by Xerox Palo Alto Research Center, Palo Alto, California

PY - 1987

Y1 - 1987

M3 - Paper

T2 - International Conference on Stability of Amorphous Silicon Alloy Materials and Devices

Y2 - 28 January 1987 through 30 January 1987

ER -