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a-SiGe:H Deposited by Hot-Wire CVD Using a Tantalum Filament Operated at Low Temperature
NREL
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Dive into the research topics of 'a-SiGe:H Deposited by Hot-Wire CVD Using a Tantalum Filament Operated at Low Temperature'. Together they form a unique fingerprint.
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Engineering
Low-Temperature
100%
Chemical Vapor Deposition
100%
Material Quality
50%
Vapor Deposition
50%
Material Science
Chemical Vapor Deposition
100%
Tantalum
100%
Film
50%