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Axel Palmstrom is a staff scientist in the Interfacial and Surface Science Group at NLR. He received his bachelor's degree in chemical engineering from the University of California, Santa Barbara and his doctorate in chemical engineering from Stanford University in the group of Professor Stacey Bent. His thesis work at Stanford focused on the development of ultrathin oxide layers by atomic layer deposition for novel thin-film solar cell architectures. Axel joined NLR as a postdoctoral researcher in 2018 where he studied interfaces, contacts, and barriers in metal halide perovskite devices. As a staff scientist, Axel is engaged with academic and industrial partners and conducts fundamental and applied research to atomic layer deposition and chemical vapor deposition growth techniques, semiconductor surfaces and interfaces, and thin-film characterization with specific interest in de-risking metal halide perovskite technologies.

Development, characterization, and innovation on thin-film growth techniques

Understanding the roles of surfaces, interfaces, and interfacial chemistry on solar cell performance and stability

Development of novel solar cell architectures